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What is PECVD (Plasma enhanced chemical vapor deposition)?

Plasma enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition (CVD) process that uses cold plasma. It uses low deposition temperatures.

Atmospheric plasma is a partially ionized gas that contains a mixture of ions, electrons, and neutral species. It is generated at atmospheric pressure and can be utilized for various surface treatments. Atmospheric plasma can be generated using different methods, including atmospheric pressure glow discharge.

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